Microstructure and texture analysis of narrow copper line versus widths and annealing for reliability improvement

In this article, we focus on the possible influence of interconnect Cu microstructure on electromigration phenomenon. First three annealing conditions were applied on interconnects. Microstructure and texture of copper were characterized by Electron BackScattered Diffraction (EBSD). Then electromigration tests have been carried out on 70 and 150 nm line widths of 45 nm node technology. In both cases no significant difference was observed in term of reliability performance versus annealing conditions. On the contrary large difference is observed on Electron BackScattered Diffraction results. Then, a statistical approach was used to investigate local microstructure and texture of copper for 150 nm line width. The results underline that morphological parameters of copper can vary versus annealing conditions but lead to similar reliability performances. We can thus conclude that these parameters are not in relationship with electromigration phenomena in these interconnects. On the other hand, high amount of misorientation has been highlighted as responsible of early failures.     

基于改进模拟退火的遗传算法求解0-1背包问题

引入改进的模拟退火思想来改进遗传算法.本算法结合了遗传算法和模拟退火算法的优点,并有效地克服了各自的弱点,使其在优化性能、优化效率和可靠性方面具有明显的优越性.运用本算法求解不同种群规模的0-1背包问题,数值试验结果表明,算法既具有较快的收敛速度,又能够收敛到最优解,优于遗传算法和模拟退火算法.     

Preparation and characterization of new window material CdS thin films at low substrate temperature (<300 K) with vacuum deposition

Low-temperature vacuum deposition instead of the commonly used vacuum deposition at high substrate temperatures has been applied to prepare new window material CdS thin films. The structural, optical and electrical properties of vacuum-evaporated CdS thin films were investigated as a function of substrate temperature (100–300 K) and the post-deposition annealing temperature (at 473, 573 and 673 K). It was determined that films deposited at all substrate temperatures were polycrystalline in nature with hexagonal structure and a strong (0 0 2) texture. The AFM and SEM studies showed that the microstructures of the as-deposited films agreed with the expectations from structure zone model. X-ray diffraction studies showed that the crystallinity of the CdS films was improved on annealing. Optical spectroscopy results of the films indicated that the optical band gap value increased from 2.40 to 2.42 eV with decreased substrate temperature. Increasing the annealing temperature sharpened the band edge. The dark resistivity increased from 4.5×10³ to 7.3×10³ Ω cm and the carrier concentration decreased from 4.7×10¹⁷ to 3.5×10¹⁵ cm⁻³ as the substrate temperature decreased from 300 to 100 K.     

退火工艺对Al离子注入的4H-SiC表面形貌的影响

通过应用多次Al离子注入和CVD中的高温退火技术,在SiC片表面形成了p型层。p型层中各深度下Al的浓度均为110¹⁹cm^-3,层厚为550nm。本文应用三种不同的退火工艺对注入后的SiC进行退火。通过测量和比较表面粗糙度,发现通过石墨层覆盖来保护表面的退火工艺可以很好的阻止SiC表面在高温退火下的粗化,粗糙度保持在3.8nm。通过其他两种(在氩气保护下、在SiC保护片的覆盖下)退火工艺退火所得到的表面有明显的台阶,粗糙度分别为12.2nm和6.6nm。     

Study of the damage produced in 6H-SiC by He irradiation

Lattice damage and evolution in 6H-SiC under He⁺ ion irradiation have been investigated by the combination of Rutherford backscattering in channeling geometry (RBS/C), Raman spectroscopy, UV–visible spectroscopy and transmission electron microscopy (TEM). 6H-SiC wafers were irradiated with He ions at a fluence of 3 × 10¹⁶ He⁺cm⁻² at 600 K. Post-irradiation, the samples were annealed in vacuum at different temperatures from 873 K to 1473 K for isochronal annealing (30 min). Thermally annealed He irradiated 6H-SiC exhibited an increase in damage or reverse annealing behavior in the damage peak region. The reverse annealing effect was found due to the nucleation and growth of He bubbles. This finding was consistent with the TEM observation. The thermal annealing brought some recovery of lattice defects and therefore the intensities of Raman peaks increased and the absorption coefficient decreased with increasing annealing temperature. The intensity of Raman peak at 789 cm⁻¹ as a function of annealing temperature was fitted in terms of a thermally activated process which yielded activation energy of 0.172 ± 0.003 eV.     

pH-dependant structural and morphology evolution of Ni(OH)2 nanostructures and their morphology retention upon thermal annealing to NiO

Nickel hydroxide nanosheets, nanobelts and nanorods were prepared by hydrothermal treatment of the precipitates obtained at different pH values. The morphology and crystal structure of the products could be controlled simply by adjusting the pH value at precipitation. Interconnected nanosheets of hexagonal β-Ni(OH)₂ with thickness around 10–20 nm were formed at pH ∼ 11, whereas nanobelts with typical widths around 40–80 nm, and nanorods with diameters around 50–60 nm of phase pure α-Ni(OH)₂ containing intercalated sulphate ions were obtained in the pH range ∼9.5–8.5. Thermal annealing of the hydroxides at 500 °C yielded cubic phase NiO with morphologies similar to their hydroxide precursors. X-ray powder diffraction (XRD), scanning electron microscopy (SEM), Fourier transform infrared spectroscopy (FTIR), thermogravimetric analysis (TGA), and energy dispersive X-ray (EDX) analysis were used to characterize the as-prepared products. The role of pH in controlling the phase and morphology of the products was discussed.     

Long-term degradation of Ta2O5-doped Bi2O3 systems

Bismuth oxide in δ-phase is a well-known high oxygen ion conductor and can be used as an electrolyte for intermediate temperature solid oxide fuel cells (IT-SOFCs). 5-10 mol% Ta₂O₅ are doped into Bi₂O₃ to stabilize δ-phase by solid state reaction process. One Bi₂O₃ sample (7.5TSB) was stabilized by 7.5 mol% Ta₂O₅ and exhibited single phase δ-Bi₂O₃-like (type I) phase. Thermo-mechanical analyzer (TMA), X-ray diffractometry (XRD), AC impedance and high-resolution transmission electron microscopy (HRTEM) were used to characterize the properties. The results showed that holding at 800-850 °C for 1 h was the appropriate sintering conditions to get dense samples. Obvious conductivity degradation phenomenon was obtained by 1000 h long-term treatment at 650 °C due to the formation of α-Bi₂O₃ phase and Bi₃TaO₇, and 〈1 1 1〉 vacancy ordering in Bi₃TaO₇ structure.     

我国高铝矾土均化料的技术进步

介绍了我国高铝矾土加工特点,提出了我国高铝矾土的发展方向应该是均化与提纯,重点介绍了矾土基均化料的工艺路线和技术发展,并对进一步产业化提出建议。     

Investigation on 3-dimensional carbon foams/LiFePO4 composites as function of the annealing time under inert atmosphere

The morphological and electrochemical investigation of 3-dimensional (3D) carbon foams coated with olivine structured lithium iron phosphate as function of the annealing time under nitrogen atmosphere is reported. The LiFePO₄ as cathode material for lithium ion batteries was prepared by a Pechini-assisted sol-gel process. The coating has been successfully performed on commercially available 3D-carbon foams by soaking in aqueous solution containing lithium, iron salts and phosphates at 70 °C for 2-4 h. After drying-out, the composites were annealed at 600 °C for different times ranging from 0.4 to 10 h under nitrogen. The formation of the olivine-like structured LiFePO₄ was confirmed by X-ray diffraction analysis performed on the powder prepared under similar conditions. The surface investigation of the prepared composites showed the formation of a homogeneous coating by LiFePO₄ on the foams. The cyclic voltammetry curves of the composites show an enhancement of electrode reaction reversibility by increasing the annealing time. The electrochemical measurements on the composites showed good performances delivering a discharge specific capacity of 85 mAh g⁻¹ at a discharging rate of C/25 at room temperature after annealing for 0.4 h and 105 mAh g⁻¹ after annealing for 5 h.